Call for paper (IF 8.4)：截止2025年1月31日

文章预览

HfO2-based thin films and devices Guest editors: Prof. Xiaoguang LI  University of Science and Technology of China, Hefei, China Assoc. Prof. Min Hyuk PARK Seoul National University, Seoul, South Korea Prof. Jiyan DAI The Hong Kong Polytechnic University, Hung Hom, Hong Kong Prof. Yuewei YIN University of Science and Technology of China, Hefei, China Special issue information: Journal of Materiomics (JMAT), indexed in SCI (Impact Factor of 8.4 in 2023) and Scopus (Citescore of 14.3), is a leading academic journal that publishes cutting-edge research in the general field of materials science, particularly systematic studies of the relationships among  composition, processing, structure, property, and performance of advanced materials. The topics that the special issue will include, but not be limited to: Advanced synthesis and characterization techniques for HfO2-based thin films. Theoretical and experimental studies of dielectric and ferroelectric properties. Memory devices and neuro ………………………………